Simple way of evaluation of thickness of nanometer transparent film SiO in process of its thermally vacuum precipitating

Abstract

Modified simple way of the evaluation of the thickness an nanometer transparent film SiO in the process of its thermally
vacuum precipitating are considered. For the evaluation of the thickness of the film on the working substrate is used interference colouration of the transparent film, simultaneously precipitated on the checking substrate, situated on vastly smaller distance from the small vaporizer, in contrast with the distance from the small vaporizer before the working substrate. Using of this way allows simplifying a technology of the fabrication of nanometer transparent films.