Determination of contact resistivity of ohmic contacts to semiconductor plates by the method Cox-Strack

Abstract

Modified variant of the method Cox-Strack, which allows to reduce an amount of frontal contacts on the test sample before 2
and simultaneously exclude an operation of the extrapolation of schedules at the determination of the specific contact resistance ρК, is considered. There is shown that contribution of the contact resistance RK in the impedance RT of the test structure takes greater values, when diameter of the frontal contact lies in the interval 40–1040 micrometer, that promote more efficient process of supervision resistivity of ohmic contacts to semiconductor plates.